DC Field | Value | Language |
---|---|---|
dc.contributor.author | Liu, W | - |
dc.contributor.author | Liou, JJ | - |
dc.contributor.author | Jiang, Y | - |
dc.contributor.author | Singh, N | - |
dc.contributor.author | Lo, GQ | - |
dc.contributor.author | Chung, J | - |
dc.contributor.author | Jeong, YH | - |
dc.date.accessioned | 2016-04-01T02:34:24Z | - |
dc.date.available | 2016-04-01T02:34:24Z | - |
dc.date.created | 2010-12-06 | - |
dc.date.issued | 2010-09 | - |
dc.identifier.issn | 0741-3106 | - |
dc.identifier.other | 2010-OAK-0000022303 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/25380 | - |
dc.description.abstract | The failure mechanisms of silicon nanowire field-effect transistors subject to electrostatic discharge (ESD) stresses are investigated using electrical characterization and microscopy analysis. Current-voltage measurements are carried out before and after the devices are stressed with ESD equivalent pulses generated from the transmission line pulsing (TLP) tester. Depending on the TLP stress level, either a soft or a hard failure can take place in the nanowire devices due to the nondestructive damage or destructive fusing of nanowires and the surrounding gate oxide. | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC | - |
dc.relation.isPartOf | IEEE ELECTRON DEVICE LETTERS | - |
dc.subject | Degradation | - |
dc.subject | electrostatic discharge (ESD) | - |
dc.subject | failure analysis | - |
dc.subject | gate oxide breakdown | - |
dc.subject | nanowire field-effect transistor (NW FET) | - |
dc.subject | GATE | - |
dc.subject | PERFORMANCE | - |
dc.subject | PROTECTION | - |
dc.subject | DESIGN | - |
dc.title | Failure Analysis of Si Nanowire Field-Effect Transistors Subject to Electrostatic Discharge Stresses | - |
dc.type | Article | - |
dc.contributor.college | 정보전자융합공학부 | - |
dc.identifier.doi | 10.1109/LED.2010.2052911 | - |
dc.author.google | Liu, W | - |
dc.author.google | Liou, JJ | - |
dc.author.google | Jiang, Y | - |
dc.author.google | Singh, N | - |
dc.author.google | Lo, GQ | - |
dc.author.google | Chung, J | - |
dc.author.google | Jeong, YH | - |
dc.relation.volume | 31 | - |
dc.relation.issue | 9 | - |
dc.relation.startpage | 915 | - |
dc.relation.lastpage | 917 | - |
dc.contributor.id | 10106021 | - |
dc.relation.journal | IEEE ELECTRON DEVICE LETTERS | - |
dc.relation.index | SCI급, SCOPUS 등재논문 | - |
dc.relation.sci | SCI | - |
dc.collections.name | Journal Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | IEEE ELECTRON DEVICE LETTERS, v.31, no.9, pp.915 - 917 | - |
dc.identifier.wosid | 000283185500005 | - |
dc.date.tcdate | 2019-02-01 | - |
dc.citation.endPage | 917 | - |
dc.citation.number | 9 | - |
dc.citation.startPage | 915 | - |
dc.citation.title | IEEE ELECTRON DEVICE LETTERS | - |
dc.citation.volume | 31 | - |
dc.contributor.affiliatedAuthor | Jeong, YH | - |
dc.identifier.scopusid | 2-s2.0-77956121413 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 6 | - |
dc.description.scptc | 8 | * |
dc.date.scptcdate | 2018-05-121 | * |
dc.type.docType | Article | - |
dc.subject.keywordPlus | GATE | - |
dc.subject.keywordPlus | PERFORMANCE | - |
dc.subject.keywordPlus | PROTECTION | - |
dc.subject.keywordAuthor | Degradation | - |
dc.subject.keywordAuthor | electrostatic discharge (ESD) | - |
dc.subject.keywordAuthor | failure analysis | - |
dc.subject.keywordAuthor | gate oxide breakdown | - |
dc.subject.keywordAuthor | nanowire field-effect transistor (NW FET) | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Engineering | - |
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