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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Chang, HJ | - |
| dc.contributor.author | Shin, H | - |
| dc.contributor.author | O'Sullivan-Hale, MN | - |
| dc.contributor.author | Boyd, RW | - |
| dc.date.accessioned | 2016-04-01T07:34:02Z | - |
| dc.date.available | 2016-04-01T07:34:02Z | - |
| dc.date.created | 2015-08-19 | - |
| dc.date.issued | 2006-11-10 | - |
| dc.identifier.issn | 0950-0340 | - |
| dc.identifier.other | 2006-OAK-0000033516 | - |
| dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/26639 | - |
| dc.description.abstract | A nonlinear optical, phase-shifted-grating method for improving the resolution of feature sizes is implemented experimentally using an N-photon lithographic material. For the recording medium, we used poly(methyl-methacrylate) (PMMA), which is a UV lithographic material that can be excited by multi-photon absorption in the visible region. We achieved a two-fold enhancement of the resolution over the standard Rayleigh limit of half of the wavelength. | - |
| dc.description.statementofresponsibility | X | - |
| dc.language | English | - |
| dc.publisher | Taylor & Francis | - |
| dc.relation.isPartOf | JOURNAL OF MODERN OPTICS | - |
| dc.title | Implementation of sub-Rayleigh-resolution lithography using an N-photon absorber | - |
| dc.type | Article | - |
| dc.contributor.college | 물리학과 | - |
| dc.identifier.doi | 10.1080/09500340600895656 | - |
| dc.author.google | Chang, HJ | - |
| dc.author.google | Shin, H | - |
| dc.author.google | O'Sullivan-Hale, MN | - |
| dc.author.google | Boyd, RW | - |
| dc.relation.volume | 53 | - |
| dc.relation.issue | 6 | - |
| dc.relation.startpage | 2271 | - |
| dc.relation.lastpage | 2277 | - |
| dc.contributor.id | 10132091 | - |
| dc.relation.journal | JOURNAL OF MODERN OPTICS | - |
| dc.relation.sci | SCI | - |
| dc.collections.name | Journal Papers | - |
| dc.type.rims | ART | - |
| dc.identifier.bibliographicCitation | JOURNAL OF MODERN OPTICS, v.53, no.6, pp.2271 - 2277 | - |
| dc.identifier.wosid | 000241552600005 | - |
| dc.date.tcdate | 2019-02-01 | - |
| dc.citation.endPage | 2277 | - |
| dc.citation.number | 6 | - |
| dc.citation.startPage | 2271 | - |
| dc.citation.title | JOURNAL OF MODERN OPTICS | - |
| dc.citation.volume | 53 | - |
| dc.contributor.affiliatedAuthor | Shin, H | - |
| dc.identifier.scopusid | 2-s2.0-33750500734 | - |
| dc.description.journalClass | 1 | - |
| dc.description.journalClass | 1 | - |
| dc.description.wostc | 20 | - |
| dc.description.scptc | 13 | * |
| dc.date.scptcdate | 2018-05-121 | * |
| dc.type.docType | Article; Proceedings Paper | - |
| dc.subject.keywordPlus | INTERFEROMETRIC OPTICAL LITHOGRAPHY | - |
| dc.subject.keywordPlus | EXPLOITING ENTANGLEMENT | - |
| dc.subject.keywordPlus | DIFFRACTION LIMIT | - |
| dc.subject.keywordPlus | 2-PHOTON EXPOSURE | - |
| dc.subject.keywordPlus | QUANTUM | - |
| dc.subject.keywordPlus | BEAT | - |
| dc.relation.journalWebOfScienceCategory | Optics | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Optics | - |
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Related Researcher
- 신희득SHIN, HEEDEUK
- Dept of Physics