Strong in-plane magnetic anisotropy in (111)-oriented CoFe2O4 thin film

Abstract

The perfect (111)-oriented CoFe2O4 thin films were grown on Pt(111)/Si substrate by pulsed laser deposition technique at substrate temperature of 600 degrees C. The optimum oxygen pressure was found to be 10 mTorr based on structural and magnetic properties. The film grown at 10 mTorr has the highest (111)orientation degree and magnetization. The films are under in-plane tensile stress due to the residual thermal strain which is thickness-dependent. It was found that the (111)-oriented CoFe204 thin film demonstrates the strong in-plane magnetic anisotropy which results from orientation as well as the stress-induced magnetic anisotropy. (C) 2013 Elsevier B.V. All rights reserved.