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Structural and electrical properties of ZnO nanorods and Ti buffer layers

Title
Structural and electrical properties of ZnO nanorods and Ti buffer layers
Authors
Kwak, CHKim, BHPark, CISeo, SYKim, SHHan, SWnull
Date Issued
2010-02
Publisher
AMER INST PHYSICS
Abstract
Vertically-well-aligned ZnO nanorods were synthesized on Ti buffer layers by a metal-organic chemical-vapor deposition process. Structural analyses demonstrated that the ZnO nanorods were well-aligned in the c-axis and ab-plane. Transmission electron microscopy (TEM) showed that the Ti buffer layer was amorphous and interdiffused into the ZnO nanorods. Energy-dispersive spectroscopy (EDS) analysis revealed the Ti buffer layers to be slightly oxide. Extended x-ray absorption fine structure confirmed the TEM and EDS results. The I-V characteristic measurements showed a 20-fold increase in current density with the Ti buffer layer, suggesting excellent electrical contact between the Ti buffer layer and ZnO nanorods.
Keywords
buffer layers; current density; electrical contacts; EXAFS; II-VI semiconductors; MOCVD; titanium; transmission electron microscopy; X-ray chemical analysis; zinc compounds; GROWTH; ARRAYS
URI
https://oasis.postech.ac.kr/handle/2014.oak/27523
DOI
10.1063/1.3308498
ISSN
0003-6951
Article Type
Article
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