DC Field | Value | Language |
---|---|---|
dc.contributor.author | Yu, HK | - |
dc.contributor.author | Kim, WK | - |
dc.contributor.author | Lee, JL | - |
dc.contributor.author | Park, EC | - |
dc.contributor.author | Kim, JS | - |
dc.contributor.author | Ryu, JH | - |
dc.date.accessioned | 2016-04-01T08:24:14Z | - |
dc.date.available | 2016-04-01T08:24:14Z | - |
dc.date.created | 2009-10-08 | - |
dc.date.issued | 2009-07 | - |
dc.identifier.issn | 0021-4922 | - |
dc.identifier.other | 2009-OAK-0000019161 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/27892 | - |
dc.description.abstract | Degradation mechanism of secondary electron emission (SEE) properties in plasma-exposed MgO films was studied using three types of plasma ion; He+, Ne+, and Ar+. As the mass of impinging ions increased from He+ to Ar+, the SEE coefficient (gamma) of MgO decreased from 0.0227 to 0.0175. Synchrotron radiation photoemission spectroscopy revealed that the Mg-to-O ratio significantly decreased from 1.00 to 0.79 in He plasma, to 0.73 in Ne plasma, and to 0.66 in Ar plasma. This was due to the preferential sputtering of Mg atoms by the high-mass ions, leading to the production of Mg vacancies (V centers) near the surface of MgO and the decrease in gamma. (C) 2009 The Japan Society of Applied Physics | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | JAPAN SOCIETY APPLIED PHYSICS | - |
dc.relation.isPartOf | JAPANESE JOURNAL OF APPLIED PHYSICS | - |
dc.subject | DISPLAY PANELS | - |
dc.subject | SURFACE | - |
dc.subject | DISCHARGE | - |
dc.subject | ION | - |
dc.title | Degradation Mechanism of Secondary Electron Emission in Plasma-Exposed MgO Films | - |
dc.type | Article | - |
dc.contributor.college | 신소재공학과 | - |
dc.identifier.doi | 10.1143/JJAP.48.076003 | - |
dc.author.google | Yu, HK | - |
dc.author.google | Kim, WK | - |
dc.author.google | Lee, JL | - |
dc.author.google | Park, EC | - |
dc.author.google | Kim, JS | - |
dc.author.google | Ryu, JH | - |
dc.relation.volume | 48 | - |
dc.relation.issue | 7 | - |
dc.contributor.id | 10105416 | - |
dc.relation.journal | JAPANESE JOURNAL OF APPLIED PHYSICS | - |
dc.relation.index | SCI급, SCOPUS 등재논문 | - |
dc.relation.sci | SCI | - |
dc.collections.name | Journal Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | JAPANESE JOURNAL OF APPLIED PHYSICS, v.48, no.7 | - |
dc.identifier.wosid | 000268546100061 | - |
dc.date.tcdate | 2019-02-01 | - |
dc.citation.number | 7 | - |
dc.citation.title | JAPANESE JOURNAL OF APPLIED PHYSICS | - |
dc.citation.volume | 48 | - |
dc.contributor.affiliatedAuthor | Lee, JL | - |
dc.identifier.scopusid | 2-s2.0-72049119085 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 5 | - |
dc.description.scptc | 5 | * |
dc.date.scptcdate | 2018-05-121 | * |
dc.type.docType | Article | - |
dc.subject.keywordPlus | DISPLAY | - |
dc.subject.keywordPlus | SURFACE | - |
dc.subject.keywordPlus | ION | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.
library@postech.ac.kr Tel: 054-279-2548
Copyrights © by 2017 Pohang University of Science ad Technology All right reserved.