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dc.contributor.authorKim, JK-
dc.contributor.authorLee, JL-
dc.contributor.authorLee, J-
dc.contributor.authorPark, Y-
dc.contributor.authorKim, T-
dc.contributor.author김종규-
dc.date.accessioned2016-04-01T08:31:30Z-
dc.date.available2016-04-01T08:31:30Z-
dc.date.issued1999-12-
dc.identifier.citationJOURNAL OF THE KOREAN PHYSICAL SOCIETY-
dc.identifier.citationv.35-
dc.identifier.citationpp.S1063-S1066-
dc.identifier.issn0374-4884-
dc.identifier.other2000-OAK-0000018753-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/28169-
dc.description.abstractNon-alloyed ohmic contacts to p-type GaN using surface treatment prior to Pt metal deposition was investigated. For the p-type GaN with a hole concentration of 1.9 x 10(17)/cm(3), the average contact resistivity drastically decreased from 4.7 x 10(-1) Omega.cm(2) to 3.7 x 10(-4) Omega.cm(2) by the surface treatment using aqua regia. X-ray photoelectron spectroscopy analysis shows that the surface treatment using aqua regia plays a role in removing the surface oxide formed on the surface of p-type GaN, and subsequently in reducing the barrier height for holes at the interface of Pt/p-type GaN, resulting in good ohmic contacts to p-type GaN.-
dc.description.statementofresponsibilityX-
dc.publisherKOREAN PHYSICAL SOC-
dc.subjectGALLIUM NITRIDE-
dc.subjectPD/AU-
dc.titlePt ohmic contact to p-type GaN with contact resistivity of 10(-4) Omega center dot cm(2) using surface treatment-
dc.typeConference-
dc.contributor.college신소재공학과-
dc.author.googleKim, JK-
dc.author.googleLee, JL-
dc.author.googleLee, J-
dc.author.googlePark, Y-
dc.author.googleKim, T-
dc.relation.volume35-
dc.relation.startpageS1063-
dc.relation.lastpageS1066-
dc.contributor.id10100864-
dc.publisher.locationKO-
dc.relation.journalJOURNAL OF THE KOREAN PHYSICAL SOCIETY-
dc.relation.indexSCI급, SCOPUS 등재논문-
dc.relation.sciSCI-
dc.collections.nameConference Papers-
dc.type.docTypeProceedings Paper-

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