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A Study of Strain Engineering Using CESL Stressor on Reliability Comparing Effect of Intrinsic Mechanical Stress SCIE SCOPUS

Title
A Study of Strain Engineering Using CESL Stressor on Reliability Comparing Effect of Intrinsic Mechanical Stress
Authors
Lee, KTKang, CYPark, MSLee, BHPark, HKHwang, HSTseng, HHJammy, RJeong, YH
Date Issued
2009-07
Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGI
Abstract
The effects of a stressor nitride layer on device performance and reliability are investigated. To decouple intrinsic mechanical stress and process-related effects, device characteristics under mechanical-bending stress and stressor layers were compared. The compressive-stressor device exhibits improved initial interface quality, although slightly degraded reliability characteristics, due to an increased hydrogen passivation of the dielectric/substrate interface. Thereby, the hydrogen passivation in the interface is found to be the primary cause of the difference in reliability characteristics.
Keywords
Contact etch stop layer (CESL); mechanical stress; metal gate/high-k; strained device
URI
https://oasis.postech.ac.kr/handle/2014.oak/28757
DOI
10.1109/LED.2009.2021007
ISSN
0741-3106
Article Type
Article
Citation
IEEE ELECTRON DEVICE LETTERS, vol. 30, no. 7, page. 760 - 762, 2009-07
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정윤하JEONG, YOON HA
Dept of Electrical Enginrg
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