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Yttrium-substituted bismuth titanate (Bi4-xYxTi3O12) thin film for use in non-volatile memories SCIE SCOPUS

Title
Yttrium-substituted bismuth titanate (Bi4-xYxTi3O12) thin film for use in non-volatile memories
Authors
Kang, SWRhee, SW
Date Issued
2004-04
Publisher
KLUWER ACADEMIC PUBL
Abstract
Fatigue-free Bi3.2Y0.8Ti3O12 (BYT) thin films were grown on Pt/TiO2/SiO2/Si substrates using direct liquid injection-metal organic chemical vapor deposition. The BYT film capacitor with top Au electrode showed higher remanent polarization (2P(r)) and lower leakage current density compared with Bi3.2La0.8Ti3O12 (BLT) film capacitors. BYT films showed strong (1 17) orientation with smaller grain size, while BLT films showed strong c-axis orientation. The 2P(r) value of the BYT capacitor was 15 muC cm(-2) and remained essentially constant up to 1 x 10(10) read/write switching cycles at a frequency of 1 MHz. The leakage current of the BYT film was 3.5 x 10(-7) A cm(-2) at an applied voltage of 2 V, which is about three orders lower than that of the BLT film. (C) 2004 Kluwer Academic Publishers.
Keywords
CHEMICAL-VAPOR-DEPOSITION; FERROELECTRIC CAPACITORS; FATIGUE; BI4TI3O12; SRBI2TA2O9; LAYER
URI
https://oasis.postech.ac.kr/handle/2014.oak/29747
DOI
10.1023/B:JMSE.0000012460.03209.74
ISSN
0957-4522
Article Type
Article
Citation
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, vol. 15, no. 4, page. 231 - 234, 2004-04
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