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화학증폭을 이용한 원자외선용 포지티브 레지스트의 표면 불용성 억제
- Title
- 화학증폭을 이용한 원자외선용 포지티브 레지스트의 표면 불용성 억제
- POSTECH Authors
- 박찬언
- Date Issued
- 1994-01
- Publisher
- 한국고분자학회
- ISSN
- 0379-153X
- Article Type
- Article
- Citation
- POLYMER-KOREA, vol. 18, no. 4, page. 622 - 631, 1994-01
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Related Researcher
- 박찬언PARK, CHAN EON
- Dept. of Chemical Enginrg