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dc.contributor.authorWoo J.-
dc.contributor.authorSong J.-
dc.contributor.authorMoon K.-
dc.contributor.authorLee J.H.-
dc.contributor.authorCha E.-
dc.contributor.authorPrakash A.-
dc.contributor.authorLee D.-
dc.contributor.authorLee S.-
dc.contributor.authorPark J.-
dc.contributor.authorKoo Y.-
dc.contributor.authorPark C.G.-
dc.contributor.authorHwang H.-
dc.date.accessioned2017-07-19T10:00:25Z-
dc.date.available2017-07-19T10:00:25Z-
dc.date.created2015-02-24-
dc.date.issued2014-09-
dc.identifier.issn0743-1562-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/34931-
dc.languageEnglish-
dc.publisherIEEE-
dc.relation.isPartOfDigest of Technical Papers - Symposium on VLSI Technology-
dc.titleElectrical and reliability characteristics of a scaled (∼30nm) tunnel barrier selector (W/Ta2O5/TaOx/TiO2/TiN) with excellent performance (JMAX > 107A/cm2)-
dc.typeArticle-
dc.identifier.doi10.1109/VLSIT.2014.6894431-
dc.type.rimsART-
dc.identifier.bibliographicCitationDigest of Technical Papers - Symposium on VLSI Technology-
dc.citation.titleDigest of Technical Papers - Symposium on VLSI Technology-
dc.contributor.affiliatedAuthorPark C.G.-
dc.identifier.scopusid2-s2.0-84907683359-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.scptc3*
dc.date.scptcdate2018-05-121*
dc.type.docTypeARTICLE-
dc.description.journalRegisteredClassscopus-

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박찬경PARK, CHAN GYUNG
Dept of Materials Science & Enginrg
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