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Thesis
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dc.contributor.author김동환en_US
dc.date.accessioned2015-02-24T13:58:54Z-
dc.date.available2015-02-24T13:58:54Z-
dc.date.issued1995en_US
dc.identifier.otherOAK-2015-01349en_US
dc.identifier.urihttp://postech.dcollection.net/jsp/common/DcLoOrgPer.jsp?sItemId=000001898500en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/3729-
dc.descriptionMasteren_US
dc.languagekoren_US
dc.publisher포항공과대학교en_US
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.title원거리 플라즈마 화학증착을 이용한 저온 규소 박막의 결정성en_US
dc.title.alternativeThe Crystallinity of silicon films deposited at low temperatures with remote plasma enhanced chemical vapor deposition (RPECVD)en_US
dc.typeThesisen_US
dc.contributor.college일반대학원 화학공학과en_US
dc.date.degree1995-02en_US
dc.type.docTypeThesis-

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