High Refractive index Ti3O5 films for dielectric metasurfaces
SCIE
SCOPUS
- Title
- High Refractive index Ti3O5 films for dielectric metasurfaces
- Authors
- Sohail Abdul Jalil; Mahreen Akram; Gwanho Yoon; Ayesha Khalid; Dasol Lee; Niloufar Raeis-Hosseini; Sunae So; Inki Kim; Qazi Salman Ahmed; Muhammad Qasim Mehmood; Junsuk Rho
- Date Issued
- 2017-07
- Publisher
- Chinese Academy of Sciences
- Abstract
- Ti3O5 films are deposited with the help of an electron beam evaporator for their applications in metasurfaces. The film of subwavelength (632 nm) thickness is deposited on a silicon substrate and annealed at 400 degrees C. The ellipsometry result shows a high refractive index above 2.5 with the minimum absorption coefficient in the visible region, which is necessary for high efficiency of transparent metasurfaces. Atomic force microscopy analysis is employed to measure the roughness of the as-deposited films. It is seen from micrographs that the deposited films are very smooth with the minimum roughness to prevent scattering and absorption losses for metasurface devices. The absence of grains and cracks can be seen by scanning electron microscope analysis, which is favorable for electron beam lithography. Fourier transform infrared spectroscopy reveals the transmission and reflection obtained from the film deposited on glass substrates. The as-deposited film shows high transmission above 60%, which is in good agreement with metasurfaces.
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/39066
- DOI
- 10.1088/0256-307X/34/8/088102
- ISSN
- 0256-307X
- Article Type
- Article
- Citation
- CHINESE PHYSICS LETTERS, vol. 34, no. 8, page. 88102-1 - 88102-3, 2017-07
- Files in This Item:
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.