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A NEW CHEMICAL AMPLIFICATION RESIST SYSTEM BASED ON NOVOLAC AND T-BOC PROTECTED PHOSPHAZENE AS A DISSOLUTION INHIBITOR
- Title
- A NEW CHEMICAL AMPLIFICATION RESIST SYSTEM BASED ON NOVOLAC AND T-BOC PROTECTED PHOSPHAZENE AS A DISSOLUTION INHIBITOR
- POSTECH Authors
- CHUN-GEUN PARK
- Date Issued
- 1992-01
- Publisher
- JAPAN SCIENCE AND TECHNOLOGY AGENCY
- ISSN
- 0914-9244
- Article Type
- Article
- Citation
- JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, vol. 5, no. 1, page. 67 - 77, 1992-01
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Related Researcher
- 박찬언PARK, CHAN EON
- Dept. of Chemical Enginrg