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Department of Materials Science & Engineering (신소재공학과)
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Article
Atomic Layer Deposition of Ni Thin Films and Application to Area-Selective Deposition
SCIE
SCOPUS
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 158, no. 1, page. D1 - D5, 2011-01
Kim, WH
;
Lee, HBR
;
Heo, K
;
Lee, YK
;
Chung, TM
;
Kim, CG
;
Hong, S
;
Heo, J
;
Kim, H
1
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GATE
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METAL
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MONOLAYER RESISTS
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NICKEL SILICIDE
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Date issued
2011
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scopus
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