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Article
High quality epitaxial CoSi2 using plasma nitridation-mediated epitaxy: The effects of the capping layerSCIESCOPUS

JOURNAL OF APPLIED PHYSICS, vol. 102, no. 9, 2007-11-01

Article
Formation of high-temperature stable Co-silicide from Co0.92Ta0.08/Si systemsSCIESCOPUS

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, vol. 40, no. 4B, page. 2712 - 2716, 2001-04

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