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Mechanical Variation of Plasma Potential, Electron Temperature, and Plasma Density SCIE SCOPUS
- Title
- Mechanical Variation of Plasma Potential, Electron Temperature, and Plasma Density
- Authors
- N Hershkowitz; Moo-Hyun Cho; J Pruski
- Date Issued
- 1992-05
- Publisher
- IOP
- Abstract
- It is shown that the plasma potential and electron temperature of capacitively coupled RF plasmas, confined in a multi-dipole plasma device. can be varied by changing the position of a grounded plate located in the surface multi-dipole magnetic field.
- ISSN
- 0963-0252
- Article Type
- Article
- Citation
- PLASMA SOURCES SCIENCE & TECHNOLOGY, vol. 1, no. 2, page. 87 - 93, 1992-05
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Related Researcher
- 조무현CHO, MOO HYUN
- Div. of Advanced Nuclear Enginrg