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Department of Electrical Engineering (전자전기공학과)
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Conference
Low temperature (<=550 degrees C) fabrication of CMOS TFT's on rapid-thermal CVD polycrystalline silicon-germanium films
, 1997-01
LEE, SK
;
CHOE, SM
;
AHN, CG
;
CHUNG, WJ
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KWON, YK
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KANG, BK
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KIM, O
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polycrystalline silicon germanium
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RTCVD
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TFT
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Date issued
1997
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