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Browsing "1. Journal Papers" by  SubjectZRO2

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Article
Highly conformal hafnium silicate film growth by atomic-layer chemical vapor deposition using a new combination of precursors: Hf(OC(CH3)(3))(4) and Si(N(CH3)(C2H5))(4)SCIESCOPUS

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, vol. 45, no. 6A, page. 5174 - 5177, 2006-06

Article
Propane dehydrogenation over vanadium-doped zirconium oxide catalystsSCIESCOPUS

CATALYSIS TODAY, vol. 352, page. 337 - 344, 2020-08

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