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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | K.H. Chae | - |
| dc.contributor.author | J.K. Kang | - |
| dc.contributor.author | T. Chang | - |
| dc.date.accessioned | 2018-05-11T09:39:08Z | - |
| dc.date.available | 2018-05-11T09:39:08Z | - |
| dc.date.created | 2009-03-26 | - |
| dc.date.issued | 1997-01 | - |
| dc.identifier.issn | 0914-9244 | - |
| dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/43492 | - |
| dc.language | English | - |
| dc.publisher | . | - |
| dc.relation.isPartOf | JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | - |
| dc.title | NEW WATER SOLUBLE NEGATIVE PHOTORESIST CONTAINING N-PHENYLMALEIMIDE GROUPS | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.identifier.bibliographicCitation | JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, v.10, pp.335 | - |
| dc.citation.startPage | 335 | - |
| dc.citation.title | JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | - |
| dc.citation.volume | 10 | - |
| dc.contributor.affiliatedAuthor | T. Chang | - |
| dc.description.journalClass | 1 | - |
| dc.description.journalClass | 1 | - |
| dc.description.journalRegisteredClass | scopus | - |
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Related Researcher
- 장태현CHANG, TAIHYUN
- Div of Advanced Materials Science