Atomic Layer Chemical Vapor Deposition of Hf-silicate Gate Dielectrics for Organic Thin Film Transister Application
- Title
- Atomic Layer Chemical Vapor Deposition of Hf-silicate Gate Dielectrics for Organic Thin Film Transister Application
- Authors
- 용기중; 이승협
- Date Issued
- 2009-10-21
- Publisher
- 한국화학공학회
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/44138
- Article Type
- Conference
- Citation
- 한국화학공학회 2009년 가을 학술대회, 2009-10-21
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