Reliability of HfO2/SiO2 Dielectric with Strain Engineering using CESL Stressor
- Title
- Reliability of HfO2/SiO2 Dielectric with Strain Engineering using CESL Stressor
- Authors
- 정윤하
- Date Issued
- 2009-04-26
- Publisher
- IEEE
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/46281
- Article Type
- Conference
- Citation
- 2009 IEEE International Reliability Physics Symposium, 2009-04-26
- Files in This Item:
- There are no files associated with this item.
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