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dc.contributor.author정윤하-
dc.date.accessioned2018-05-23T15:03:04Z-
dc.date.available2018-05-23T15:03:04Z-
dc.date.created2010-05-10-
dc.date.issued2009-02-19-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/46284-
dc.publisherKorean Conference on Semiconductors-
dc.relation.isPartOf16th Korean Conference on Semiconductors-
dc.relation.isPartOf16TH KOREAN CONFERENCE ON SEMICONDUCTORS-
dc.title35 nm T-gate In0.52Al0.48As/In0.53Ga0.47As/GaAs Metamorphic HEMTs with an Ultrahigh fmax of 610 GHz-
dc.typeConference-
dc.type.rimsCONF-
dc.identifier.bibliographicCitation16th Korean Conference on Semiconductors-
dc.citation.conferenceDate2009-02-18-
dc.citation.conferencePlaceKO-
dc.citation.title16th Korean Conference on Semiconductors-
dc.contributor.affiliatedAuthor정윤하-
dc.description.journalClass2-
dc.description.journalClass2-

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정윤하JEONG, YOON HA
Dept of Electrical Enginrg
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