PE(plasma enhanced) ALD and thermal ALD of TaCxNy films with TBTDET(tert-butylimido tris-diethylamido tantalum) and H2/NH3
- Title
- PE(plasma enhanced) ALD and thermal ALD of TaCxNy films with TBTDET(tert-butylimido tris-diethylamido tantalum) and H2/NH3
- Authors
- 이시우; 김석훈
- Date Issued
- 2010-06-22
- Publisher
- ALD2010
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/46939
- Article Type
- Conference
- Citation
- 10th International Conference on Atomic Layer Deposition, 2010-06-22
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- There are no files associated with this item.
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