Selective sub-10 nm etching of SiO2 layer by carbothermal reduction using single walled carbon nanotubes
- Title
- Selective sub-10 nm etching of SiO2 layer by carbothermal reduction using single walled carbon nanotubes
- Authors
- 최희철
- Date Issued
- 2007-07-19
- Publisher
- 대한화학회
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/47053
- Article Type
- Conference
- Citation
- 제1회 한영화학워크샵, 2007-07-19
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- There are no files associated with this item.
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