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dc.contributor.author정윤하-
dc.date.accessioned2018-05-23T15:55:21Z-
dc.date.available2018-05-23T15:55:21Z-
dc.date.created2010-10-26-
dc.date.issued2010-10-15-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/47214-
dc.publisherIEEE-
dc.relation.isPartOfIEEE NMDC(Nanotechnology Materials and Devices conference)-
dc.relation.isPartOfPROCEEDING OF IEEE NANOTECHNOLOGY MATERIALS AND DEVICES CONFERENCE-
dc.titleAn equivalent circuit model for high-k/metal gate stack MOS capacitor with dynamic leakage-
dc.typeConference-
dc.type.rimsCONF-
dc.identifier.bibliographicCitationIEEE NMDC(Nanotechnology Materials and Devices conference), pp.291 - 294-
dc.citation.conferenceDate2010-10-12-
dc.citation.conferencePlaceUS-
dc.citation.endPage294-
dc.citation.startPage291-
dc.citation.titleIEEE NMDC(Nanotechnology Materials and Devices conference)-
dc.contributor.affiliatedAuthor정윤하-
dc.description.journalClass1-
dc.description.journalClass1-

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정윤하JEONG, YOON HA
Dept of Electrical Enginrg
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