Chemical Origin of Thermally Enhanced Hole Doping in Graphene on Silica Substrates
- Title
- Chemical Origin of Thermally Enhanced Hole Doping in Graphene on Silica Substrates
- Authors
- 류순민
- Date Issued
- 2017-02-22
- Publisher
- 나노광학기술연구회
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/47954
- Article Type
- Conference
- Citation
- 2017 KNOS-Winter Workshop, 2017-02-22
- Files in This Item:
- There are no files associated with this item.
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