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Cited 7 time in webofscience Cited 7 time in scopus
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dc.contributor.authorMisha, SH-
dc.contributor.authorTamanna, N-
dc.contributor.authorPrakash, Amit-
dc.contributor.authorSong, J-
dc.contributor.authorLee, D-
dc.contributor.authorCha, E-
dc.contributor.authorHwang, H-
dc.date.accessioned2018-06-07T01:02:35Z-
dc.date.available2018-06-07T01:02:35Z-
dc.date.created2015-08-11-
dc.date.issued2015-04-
dc.identifier.issn0021-4922-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/50130-
dc.description.abstractTo implement a cross-point memory array successfully, it is highly required to develop nonlinear selector devices. Insulator–metal transition (IMT) devices are promising candidates for selector applications. Although IMT characteristics of SmNiO3 with a high transition temperature of 130 °C have already been reported, the film deposition conditions following high-pressure oxygen annealing at high temperatures are not practical for high-density memory applications. In this report, we propose a simple electrical method to form a localized IMT SmNiO3 region in a sputter-deposited SmNiOx film. The nanoscale IMT device formed by the electro thermal effect shows promising selector characteristics such as switching uniformity, switching endurance (>105 cycles), and high temperature stability. The feasibility of good selector characteristics is also investigated by serially connecting the selector device (SmNiO3 IMT) to a Ta/Ta2O5/Pt resistive random access memory (ReRAM) device.-
dc.languageEnglish-
dc.publisherInstitute of Physics (IOP) science-
dc.relation.isPartOfJAPANESE JOURNAL OF APPLIED PHYSICS-
dc.titleComprehensive analysis of electro thermally driven nanoscale insulator–metal transition SmNiO3-based selector for cross-point memory array-
dc.typeArticle-
dc.identifier.doi10.7567/JJAP.54.04DD09-
dc.type.rimsART-
dc.identifier.bibliographicCitationJAPANESE JOURNAL OF APPLIED PHYSICS, v.54, no.4, pp.04DD09-
dc.identifier.wosid000357694000041-
dc.date.tcdate2019-02-01-
dc.citation.number4-
dc.citation.startPage04DD09-
dc.citation.titleJAPANESE JOURNAL OF APPLIED PHYSICS-
dc.citation.volume54-
dc.contributor.affiliatedAuthorPrakash, Amit-
dc.contributor.affiliatedAuthorHwang, H-
dc.identifier.scopusid2-s2.0-84926313384-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc3-
dc.type.docTypeArticle; Proceedings Paper-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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황현상HWANG, HYUNSANG
Dept of Materials Science & Enginrg
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