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Chemical vapor deposition of TaCxNy films using tert-butylimido tris-diethylamido tantalum (TBTDET): reaction mechanism and film charateristics
- Title
- Chemical vapor deposition of TaCxNy films using tert-butylimido tris-diethylamido tantalum (TBTDET): reaction mechanism and film charateristics
- Date Issued
- 2009-11-05
- Publisher
- 한국재료학회
- Article Type
- Conference
- Citation
- 2009년도 한국재료학회 추계학술발표대회 및 제17회 신소재 심포지엄, 2009-11-05
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