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Removal of 10nm contaminant particles from a wafer surface with supersonic CO2 particle beam

Title
Removal of 10nm contaminant particles from a wafer surface with supersonic CO2 particle beam
Authors
이진원김인호김의재
Date Issued
2011-06-15
Publisher
Clean tech
URI
https://oasis.postech.ac.kr/handle/2014.oak/59936
Article Type
Conference
Citation
Nanotech 2011, 2011-06-15
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이진원LEE, JIN WON
Dept of Mechanical Enginrg
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