Reliability Properties in sub-50nm High Performance High-k/Metal Gate Stacks SiGe pMOSFETs
- Title
- Reliability Properties in sub-50nm High Performance High-k/Metal Gate Stacks SiGe pMOSFETs
- Authors
- 정윤하
- Date Issued
- 2010-10-13
- Publisher
- IEEE
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/61515
- Article Type
- Conference
- Citation
- Nanotechnology Materials and Devices Conference, 2010-10-13
- Files in This Item:
- There are no files associated with this item.
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