RF Performance Degradation in 100-nm Metal Gate/High-k Dielectric nMOSFET by Hot Carrier Effects
- Title
- RF Performance Degradation in 100-nm Metal Gate/High-k Dielectric nMOSFET by Hot Carrier Effects
- Authors
- 정윤하
- Date Issued
- 2009-09-16
- Publisher
- IEEE
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/61518
- Article Type
- Conference
- Citation
- 2009 IEEE European Solid-State Device Research Conference, 2009-09-16
- Files in This Item:
- There are no files associated with this item.
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