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In-Situ Control of Oxygen Vacancy Concentration by ALD for Resistive Switching Devices
- Title
- In-Situ Control of Oxygen Vacancy Concentration by ALD for Resistive Switching Devices
- Date Issued
- 2012-06-20
- Publisher
- ALD 2012
- Article Type
- Conference
- Citation
- 12th International Conference on Atomic Layer Deposition, 2012-06-20
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