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An Experimental Study on Channel Backscattering in High-k/Metal Gate nMOSFETs

Title
An Experimental Study on Channel Backscattering in High-k/Metal Gate nMOSFETs
Authors
정윤하
Date Issued
2012-10-14
Publisher
IEEE
URI
https://oasis.postech.ac.kr/handle/2014.oak/63810
Article Type
Conference
Citation
2012 IEEE International Integrated Reliability Workshop, 2012-10-14
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정윤하JEONG, YOON HA
Dept of Electrical Enginrg
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