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TiOx Layer Engineering for Producing Non-Linear Characteristic in HfOx-based Resistive Random Access Memory

Title
TiOx Layer Engineering for Producing Non-Linear Characteristic in HfOx-based Resistive Random Access Memory
Authors
황현상
Date Issued
2012-12-06
Publisher
43rd IEEE Semiconductor Interface Specialists Conference
URI
https://oasis.postech.ac.kr/handle/2014.oak/64313
Article Type
Conference
Citation
43rd IEEE Semiconductor Interface Specialists Conference, 2012-12-06
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황현상HWANG, HYUNSANG
Dept of Materials Science & Enginrg
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