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Gas Permeation Barrier and Water Resistance Properties of Al2O3/TiO2 Nano-Laminated Film Deposited by Plasma-Enhanced Atomic Layer Deposition for OTFT Passivation
- Title
- Gas Permeation Barrier and Water Resistance Properties of Al2O3/TiO2 Nano-Laminated Film Deposited by Plasma-Enhanced Atomic Layer Deposition for OTFT Passivation
- Date Issued
- 2013-11-13
- Publisher
- Center for Advanced Soft Electronics (CASE), Polymer Research Institute (PRI), POSTECH
- Article Type
- Conference
- Citation
- A-COE 2013 5th Asian Conference on Organic Electronics, 2013-11-13
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Related Researcher
- 박찬언PARK, CHAN EON
- Dept. of Chemical Enginrg