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Al2O3/TiO2 nano-laminate film deposited by plasma-enhanced atomic layer deposition (PEALD) for thin film encapsulation of organic electronic devices
- Title
- Al2O3/TiO2 nano-laminate film deposited by plasma-enhanced atomic layer deposition (PEALD) for thin film encapsulation of organic electronic devices
- Date Issued
- 2013-10-10
- Publisher
- 한국고분자학회
- Article Type
- Conference
- Citation
- 2013 추계학술대회, 2013-10-10
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Related Researcher
- 박찬언PARK, CHAN EON
- Dept. of Chemical Enginrg