Multi-layer tunnel barrier (Ta2O5/TaO x/TiO2) engineering for bipolar RRAM selector applications
- Title
- Multi-layer tunnel barrier (Ta2O5/TaO x/TiO2) engineering for bipolar RRAM selector applications
- Authors
- 황현상
- Date Issued
- 2013-06-13
- Publisher
- Japan Society of Applied Physics, IEEE Electron Devices Society and Solid State Circuits Society
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/65450
- Article Type
- Conference
- Citation
- 2013 Symposia on VLSI Technology and Circuits, 2013-06-13
- Files in This Item:
- There are no files associated with this item.
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