An Improved 3D Monte Carlo Simulation of Reaction Diffusion Model for Accurate Prediction of the NBTI Stress/Relaxation
- Title
- An Improved 3D Monte Carlo Simulation of Reaction Diffusion Model for Accurate Prediction of the NBTI Stress/Relaxation
- Authors
- 백창기
- Date Issued
- 2012-09-05
- Publisher
- International Conference on Simulation of Semiconductor Processes and Devices
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/66316
- Article Type
- Conference
- Citation
- 2012 IEEE 17th International Conference on Simulation of Semiconductor Processes and Devices, 2012-09-05
- Files in This Item:
- There are no files associated with this item.
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