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An Improved 3D Monte Carlo Simulation of Reaction Diffusion Model for Accurate Prediction of the NBTI Stress/Relaxation

Title
An Improved 3D Monte Carlo Simulation of Reaction Diffusion Model for Accurate Prediction of the NBTI Stress/Relaxation
Authors
백창기
Date Issued
2012-09-05
Publisher
International Conference on Simulation of Semiconductor Processes and Devices
URI
https://oasis.postech.ac.kr/handle/2014.oak/66316
Article Type
Conference
Citation
2012 IEEE 17th International Conference on Simulation of Semiconductor Processes and Devices, 2012-09-05
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