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Analysis of Bottom Channel Effect in Silicon Nanowire FET based on Bulk-Silicon: Reduction of Parasitic Capacitance caused by SiGe layer

Title
Analysis of Bottom Channel Effect in Silicon Nanowire FET based on Bulk-Silicon: Reduction of Parasitic Capacitance caused by SiGe layer
Authors
백창기
Date Issued
2011-09-29
Publisher
SSDM
URI
https://oasis.postech.ac.kr/handle/2014.oak/68460
Article Type
Conference
Citation
2011 International Conference on Solid State and Device Materials, 2011-09-29
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