Voltage-induced Insulator-to-metal Transition of Hydrogen-treated NbO2 Thin Films with Tunneling Barrier
- Title
- Voltage-induced Insulator-to-metal Transition of Hydrogen-treated NbO2 Thin Films with Tunneling Barrier
- Authors
- 손준우; 강민국; 유상배; 조민국
- Date Issued
- 2016-02-01
- Publisher
- 유전체연구회
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/70587
- Article Type
- Conference
- Citation
- 12회 유전체연합심포지엄, 2016-02-01
- Files in This Item:
- There are no files associated with this item.
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