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Improvement of electrical properties in high k gate oxide by F plasma treatmetns
- Title
- Improvement of electrical properties in high k gate oxide by F plasma treatmetns
- Authors
- 김형준
- Date Issued
- 2008-04-01
- Publisher
- The korean Physical Society
- Article Type
- Conference
- Citation
- The korean Physical Society, 2008-04-01
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Related Researcher
- 김형준KIM, HYUNGJUN
- Dept of Materials Science & Enginrg