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The atomic layer deposition of oxides and metals for next generation semiconductor devices
- Title
- The atomic layer deposition of oxides and metals for next generation semiconductor devices
- Authors
- 김형준
- Date Issued
- 2008-03-16
- Publisher
- ISTC
- Article Type
- Conference
- Citation
- ISTC 2008, 2008-03-16
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Related Researcher
- 김형준KIM, HYUNGJUN
- Dept of Materials Science & Enginrg