Full metadata record
DC Field | Value | Language |
dc.contributor.author | 정윤하 | - |
dc.date.accessioned | 2018-06-19T08:31:28Z | - |
dc.date.available | 2018-06-19T08:31:28Z | - |
dc.date.created | 2009-03-27 | - |
dc.date.issued | 2007-09-18 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/72529 | - |
dc.publisher | IEEE | - |
dc.relation.isPartOf | 2007 International Conference on Solid State Devices and Materials (SSDM 2007) | - |
dc.relation.isPartOf | International Conference on Solid State Devices and Materials proceeding | - |
dc.title | Effects of O2 Plasma Treatment on the Reliabilities of Metal Gate/High-k Dielectric MOSFETs | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.identifier.bibliographicCitation | 2007 International Conference on Solid State Devices and Materials (SSDM 2007), pp.718 - 719 | - |
dc.citation.conferenceDate | 2007-09-18 | - |
dc.citation.conferencePlace | JA | - |
dc.citation.endPage | 719 | - |
dc.citation.startPage | 718 | - |
dc.citation.title | 2007 International Conference on Solid State Devices and Materials (SSDM 2007) | - |
dc.contributor.affiliatedAuthor | 정윤하 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
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