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Highly conformal Ru Atomic Layer Deposition for application to nanoelectronic devices
- Title
- Highly conformal Ru Atomic Layer Deposition for application to nanoelectronic devices
- Authors
- 김형준
- Date Issued
- 2007-06-01
- Publisher
- ECS
- Article Type
- Conference
- Citation
- Electrochemical Society Meeting 2007, 2007-06-01
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Related Researcher
- 김형준KIM, HYUNGJUN
- Dept of Materials Science & Enginrg