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Atomic Layer Chemical Vapor Deposition and Characterization of Ti-silicate Gate Dielectrics Using Tetrakis-diethylamido Titanium (TDEAT) and Tetrabutoxyorthosilane (TBOS)
- Title
- Atomic Layer Chemical Vapor Deposition and Characterization of Ti-silicate Gate Dielectrics Using Tetrakis-diethylamido Titanium (TDEAT) and Tetrabutoxyorthosilane (TBOS)
- Authors
- 용기중
- Date Issued
- 2007-04-01
- Article Type
- Conference
- Citation
- 화학공학회 2007 봄 정기학술대회, 2007-04-01
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Related Researcher
- 용기중YONG, KIJUNG
- Dept. of Chemical Enginrg