Conference
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 용기중 | - |
| dc.date.accessioned | 2018-06-21T03:04:41Z | - |
| dc.date.available | 2018-06-21T03:04:41Z | - |
| dc.date.created | 2009-03-27 | - |
| dc.date.issued | 2006-07-25 | - |
| dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/72801 | - |
| dc.relation.isPartOf | 6th International Conference on Atomic Layer Deposition | - |
| dc.relation.isPartOf | 6th International Conference on Atomic Layer Deposition | - |
| dc.title | Atomic Layer Chemical Vapor Deposition of Metal (Hafnium, Titanium) Silicate Film using a New Combination of Precursors; Hf(N(C2H5)2)4, (Ti(N(C2H5)2)4 and Si(OnBu)4 | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.identifier.bibliographicCitation | 6th International Conference on Atomic Layer Deposition, pp.124 | - |
| dc.citation.startPage | 124 | - |
| dc.citation.title | 6th International Conference on Atomic Layer Deposition | - |
| dc.contributor.affiliatedAuthor | 용기중 | - |
| dc.description.journalClass | 1 | - |
| dc.description.journalClass | 1 | - |
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Related Researcher
- 용기중YONG, KIJUNG
- Dept. of Chemical Enginrg