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Atomic layer chemical vapor deposition and characterization of Hf-silicate, Hf-silicate/Al2O3 and Hf-silicate/SiO2 gate dielectrics
- Title
- Atomic layer chemical vapor deposition and characterization of Hf-silicate, Hf-silicate/Al2O3 and Hf-silicate/SiO2 gate dielectrics
- Authors
- 용기중
- Date Issued
- 2005-10-31
- Publisher
- AVS
- Article Type
- Conference
- Citation
- American Vacuum Society 52nd Symposium, 2005-10-31
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Related Researcher
- 용기중YONG, KIJUNG
- Dept. of Chemical Enginrg