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The ALD of various oxides from alkylamide precursors: the growth and film properties

Title
The ALD of various oxides from alkylamide precursors: the growth and film properties
Authors
김형준
Date Issued
2005-08-01
URI
https://oasis.postech.ac.kr/handle/2014.oak/73086
Article Type
Conference
Citation
5th American Vacuum Society Topical Conference on Atomic Layer Deposition, 2005-08-01
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김형준KIM, HYUNGJUN
Dept of Materials Science & Enginrg
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