Atomic layer chemical vapor deposition and characterization of hafnium silicate films
- Title
- Atomic layer chemical vapor deposition and characterization of hafnium silicate films
- Authors
- 용기중
- Date Issued
- 2004-10-01
- Publisher
- 화학공학회
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/73439
- Article Type
- Conference
- Citation
- 2004 화학공학회 가을 학술대회, 2004-10-01
- Files in This Item:
- There are no files associated with this item.
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