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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 이정수 | - |
| dc.date.accessioned | 2018-06-21T04:16:27Z | - |
| dc.date.available | 2018-06-21T04:16:27Z | - |
| dc.date.created | 2009-03-27 | - |
| dc.date.issued | 2002-12-01 | - |
| dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/74168 | - |
| dc.publisher | IEEE | - |
| dc.relation.isPartOf | IEEE International Electron Devices Meeting | - |
| dc.relation.isPartOf | IEEE IEDM Technical Digest | - |
| dc.title | FinFET Process Refinement for Improved Mobility and Gate Work Function Engineering | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.identifier.bibliographicCitation | IEEE International Electron Devices Meeting, pp.259 - 262 | - |
| dc.citation.endPage | 262 | - |
| dc.citation.startPage | 259 | - |
| dc.citation.title | IEEE International Electron Devices Meeting | - |
| dc.contributor.affiliatedAuthor | 이정수 | - |
| dc.description.journalClass | 1 | - |
| dc.description.journalClass | 1 | - |
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Related Researcher
- 이정수LEE, JEONG SOO
- Dept of Electrical Enginrg